High-Purity Sputtering Targets
Metal, alloy, oxide and ceramic targets in standard and custom sizes.
Sputtering Target
High-Purity Sputtering Targets
High-Purity Sputtering Targets are supplied in a wide range of metals, alloys, oxides and ceramics with purities up to 99.999%. Standard disc sizes and custom geometries are available, bonded to copper backing plates when required, each with a material certificate.
Key Features
- Purity 99.9% to 99.999%
- Standard 1"–6" discs and custom shapes
- Indium-bonded backing plates
- Material certification supplied
Applications
Sputter depositionOptical filmsSemiconductor research
Technical Specifications
| Product Type | Sputtering target |
|---|---|
| Purity | 99.9% – 99.999% |
| Materials | Metals, alloys, oxides, ceramics |
| Diameter | 25 – 150 mm |
| Thickness | 1 – 6 mm |
| Bonding | Unbonded / indium bonded |
| Available Models | Standard & custom |
| Support Available | Material selection guidance |