RF / DC Magnetron Sputtering System
Multi-target magnetron sputtering platform for metal, alloy and dielectric thin films.
Sputtering Systems
RF / DC Magnetron Sputtering System
The RF/DC Magnetron Sputtering System deposits uniform thin films from metal, alloy, oxide and ceramic targets. Configurable with multiple magnetron sources, substrate heating, rotation and RF bias, it supports both research and small-batch production coating.
Key Features
- RF, DC and pulsed-DC power supplies
- Two to four confocal magnetron sources
- Substrate heating up to 800 °C
- Load-lock and reactive gas options
Applications
Optical coatingsMetallisationSensor filmsMaterials research
Technical Specifications
| Product Type | Magnetron sputtering system |
|---|---|
| Base Pressure | 5×10⁻⁷ mbar |
| Target Size | 2" / 3" / 4" |
| Substrate Size | Up to 150 mm |
| Power Source | RF 300 W / DC 500 W |
| Chamber | SS304 electropolished |
| Available Models | Single & multi-target |
| Support Available | Installation, AMC, process training |